Technology
VCD Equipment
The Nite VCD equipment provides vacuum drying and curing solutions for materials such as photoresists, perovskites, and organic displays. The company has completed the development of large, medium, and small generations of VCD products. Through reasonable structural design and flow field optimization, the pumping speed and uniformity of the drying chamber have been improved, and the temperature of the carrier and the condensation plate is uniformly controllable. The self-developed control system has open functions, adjustable multi-stage vacuum, pumping speed, and holding time, making it convenient for users to adjust process parameters. It supports monitoring, measurement, saving, and exporting of process parameters, effectively providing support for process development.
tel：027-63495836
email：sales@whnite.com- Technical Parameter Equipment technology advantages More Products
Technical Parameter
- ●Substrate siz：customizable
- ●Sealed cavity leakage rate：≤0.05vol%/h
- ●Ultimate vacuum：1.5x10-4 Pa and above
- ●Pumping speed：0~100mbar/s (adjustable)
- ●Substrate stage temperature：0~60℃, ±1℃ (customizable)
- ●Cold plate temperature：0~60℃, ±1℃ (customizable)
Product Application
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Flow field direction
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Uniformity of the flow field
