Technology
NEJ-ES equipment
The Nite NEJ-ES equipment employs electrohydrodynamic atomization technology. By leveraging a high-voltage electric field to guide the tip of a high-speed jet to surpass the Rayleigh limit, it generates femtoliter (fL)-level droplets. This process enables the deposition of uniform and dense films with a thickness of ≥50 nm. It is primarily designed for the efficient preparation of high-viscosity materials and ultrathin film layers. The equipment can be equipped with arrayed printheads to meet mass production requirements. It holds significant application value in micro- and nano-optics, especially in solutions for ultrathin film layers in AR and VR.
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email：sales@whnite.com- Technical Parameter Equipment technology advantages More Products
Technical Parameter
- ●Substrate Size：Customizable
- ●Droplet Volume：Femtoliter (fL) level
- ●Material Viscosity：≤500 cps
- ●Film Thickness Uniformity：≤5%
- ●Minimum Film Thickness：50 nm
- ●Applicable Material Systems：Photoresist, perovskite, nanomaterials, polymer monomers, and other organic/inorganic inks
- ●Application Fields：Lithography, displays, solar cells, fuel cells, thin-film encapsulation, pharmaceuticals, etc.
Product Application
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Positive/negative photoresist, film thickness 2 μm
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Nanoimprint Resist, Film Thickness: 400 nm
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Thermosetting TFE, film thickness 3μm
