Wuhan National Innovation Technology Optoelectronics Equipment Co., Ltd. - Wuhan National Innovation Technology Optoelectronics Equipment Co., Ltd.

Transform manufacturing technology, pioneer the future vision.

build a benchmark enterprise for high-end novel display manufacturing equipments.

PRODUCT

NEJ-PR Mass Production Equipment

Substrate Size：Customizable

Droplet Volume：2.4/3.5/6/13pL(optional)

Printing Accuracy：≤±7.5μm

Motion Accuracy：≤±2μm

Droplet Volume Control：±5％

Cleanliness Level：lSO3

NEJ-E/P Equipment

Substrate Size：Customizable

Droplet Volume：Electrohydrodynamic (EHD) printing

fL (femtoliter) level：Piezoelectric

(PZT) printing：3.5/6/10 pL (optional)

Motion Accuracy：≤±3 μm

Droplet Volume Control：±5%

VCD Equipment

Substrate siz：customizable

Sealed cavity leakage rate：≤0.05vol%/h

Ultimate vacuum：1.5x10-4 Pa and above

Pumping speed：0~100mbar/s (adjustable)

Substrate stage temperature：0~60℃, ±1℃ (customizable)

Cold plate temperature：0~60℃, ±1℃ (customizable)

TM equipment

Substrate Size：Customizable

Robot Accuracy：≤+0.5mm (optional)

Sealed Chamber Leakage Rate：≤0.05vol%/h

Water and Oxygen Content Control：≤1ppm

Temperature Control Accuracy：Room temperature ±1℃ (customizable)

Cleanliness Level：ISO Class 3

NEJ-EB Equipment

Substrate size：customizable

Ink droplet volume：fL

Positioning accuracy：≤±10μm

Repeat positioning accuracy：≤±5μm

X/Y-axis printing speed：150mm/s

Printing frequency：500Hz

NEJ-EH Equipment

Substrate size：customizable

Ink droplet volume： fL level

Positioning accuracy：≤±5μm

Repeat positioning accuracy：≤±3μm

Print frequency：1000Hz

High voltage power supply：0~±5000V

UV Equipment

Substrate size： customizable

UV light intensity：1.5J/cm2，10%-100% (adjustable)

Uniformity of UV light intensity：≥95%

UV scanning speed：250mm/s (adjustable)

UV light source wavelength：395nm (optional)

Water oxygen content control：≤1ppm

NEJ-EP Equipment

Ink droplet volume：fL level

Positioning accuracy：≤±1μm

Repeat positioning accuracy：≤±0.5μm

Print frequency：7000Hz

High voltage power supply：0~±5000V

Vision System：Sub-micron Level Positioning Vision + Multi-Magnification Observation Vision

NEI-AOI Equipment

Substrate Size：OLED/LCD full-size panels

Defect Detection Size：Visible defect detection and classification corresponding to a single subpixel

Missed Detection Rate：Missed detection ≤ 0.1%; False detection ≤ 5%

Supported Product Resolution：4K and above

Recheck Layering Function：Distinguishes defects in pixel layers, panels, POL, CG, and other layers

Automation Functions：Automatic WD (working distance), automatic focus, automatic exposure, image quality analysis

NEJ-EF Equipment

Substrate Size：Customizable

Dot/Line Size：1~20 μm

Dot/Line Thinkness：0.5~5 μm

Printing Accuracy：≤ ±2 μm

Motion Accuracy：≤±1 μm

Nozzle Alignment Accuracy： ≤1 μm

COMPANY PROFILE

Wuhan National Innovation Technology Optoelectronics Equipment Co., Ltd. is located in Wuhan Optical Valley, with the mission of solving the stranglehold problem of high-end equipment. It aims to develop large-area, high-efficiency, high-precision OLED, QLED, MicroLED and other jet printing manufacturing processes, technologies and equipments in the novel display field. Our goal is to promote the technological transformation of the industry and build a benchmark enterprise for high-end novel display manufacturing equipments.

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