Revolutionize manufacturing technologies Inaugurate the future of visual world
Committed to building a benchmark enterprise for localization of high-end equipment for novel displays.
PRODUCT

NEJ-PR Mass Production Equipment

    Substrate Size：Customizable

    Droplet Volume：2.4/3.5/6/13pL(optional)

    Printing Accuracy：≤±7.5μm

    Motion Accuracy：≤±2μm

    Droplet Volume Control：±5％

    Cleanliness Level：lSO3

NEJ-E/P Equipment

    Substrate Size：Customizable

    Droplet Volume：Electrohydrodynamic (EHD) printing

    fL (femtoliter) level：Piezoelectric

    (PZT) printing：3.5/6/10 pL (optional)

    Motion Accuracy：≤±3 μm

    Droplet Volume Control：±5%

VCD Equipment

    Substrate siz：customizable

    Sealed cavity leakage rate：≤0.05vol%/h

    Ultimate vacuum：1.5x10-4 Pa and above

    Pumping speed：0~100mbar/s (adjustable)

    Substrate stage temperature：0~60℃, ±1℃ (customizable)

    Cold plate temperature：0~60℃, ±1℃ (customizable)

TM equipment

    Substrate Size：Customizable

    Robot Accuracy：≤+0.5mm (optional)

    Sealed Chamber Leakage Rate：≤0.05vol%/h

    Water and Oxygen Content Control：≤1ppm

    Temperature Control Accuracy：Room temperature ±1℃ (customizable)

    Cleanliness Level：ISO Class 3

NEJ-EP Equipment

    Ink droplet volume：fL level

    Positioning accuracy：≤±1μm

    Repeat positioning accuracy：≤±0.5μm

    Print frequency：7000Hz

    High voltage power supply：0~±5000V

    Vision System：Sub-micron Level Positioning Vision + Multi-Magnification Observation Vision

NEJ-EB Equipment

    Substrate size：customizable

    Ink droplet volume：fL

    Positioning accuracy：≤±10μm

    Repeat positioning accuracy：≤±5μm

    X/Y-axis printing speed：150mm/s

    Printing frequency：500Hz

UV Equipment

    Substrate size： customizable

    UV light intensity：1.5J/cm2，10%-100% (adjustable)

    Uniformity of UV light intensity：≥95%

    UV scanning speed：250mm/s (adjustable)

    UV light source wavelength：395nm (optional)

    Water oxygen content control：≤1ppm

NEI-AOI Equipment

    Substrate Size：OLED/LCD full-size panels

    Defect Detection Size：Visible defect detection and classification corresponding to a single subpixel

    Missed Detection Rate：Missed detection ≤ 0.1%; False detection ≤ 5%

    Supported Product Resolution：4K and above

    Recheck Layering Function：Distinguishes defects in pixel layers, panels, POL, CG, and other layers

    Automation Functions：Automatic WD (working distance), automatic focus, automatic exposure, image quality analysis

NEJ-EH Equipment

    Substrate size：customizable

    Ink droplet volume： fL level

    Positioning accuracy：≤±5μm

    Repeat positioning accuracy：≤±3μm

    Print frequency：1000Hz

    High voltage power supply：0~±5000V

NEJ-EF Equipment

    Substrate Size：Customizable

    Dot/Line Size：1~20 μm

    Dot/Line Thinkness：0.5~5 μm

    Printing Accuracy：≤ ±2 μm

    Motion Accuracy：≤±1 μm

    Nozzle Alignment Accuracy： ≤1 μm

COMPANY PROFILE

     The headquarters of Wuhan Guochuangke Optoelectronic Equipment Co., Ltd. is located in Wuhan·Optical Valley, with its subsidiary, Guangdong Guochuangke, situated in Nanhai District, Foshan. Aligning with national high-end equipment development strategies and market demands, Guochuangke focuses on key common technologies for new display printing manufacturing, core equipment development, and large-area, high-precision, high-efficiency OLED, QLED, Micro-LED, E-paper, and related display device printing manufacturing. The company aims to achieve the development and market application of independently controllable key equipment for new display manufacturing, striving to become a "benchmark enterprise for the localization of high-end new display equipment."

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INDUSTRY APPLICATIONS

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